Second-generation platform delivers advanced control, in-cycle annealing, and high-throughput performance for Wide Bandgap power and RF device manufacturing ESPOO, Finland, Nov. 24, 2025 /PRNewswire/ ...

How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.

BILTHOVEN, THE NETHERLANDS, December 11, 2008 – Further extending its leadership in the critical atomic layer deposition (ALD) market, ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) ...

ESPOO, Finland, Nov. 28, 2017 /PRNewswire/ -- Picosun Oy (Finland), Silex Microsystems AB (Sweden), and Pegasus Chemicals Ltd (UK) have joined forces to develop and provide novel ALD (Atomic Layer ...

SkyWater Technology announced on September 7 that it will offer customers a new semiconductor processing tool for atomic layer deposition (ALD), the Applied Picosun MorpherTM. Many devices, such as ...

Atomic Layer Deposition (ALD) is a manufacturing method at the atomic and near-atomic scale. Since its invention in the 1970s, ALD has been industrially applied in fields such as displays, ...

The Atomic Layer Deposition (ALD) process supplies the most precise, scalable, best performing, reproducible and cost-effective coating process to decrease unwanted reactions and increase the ...

Figure shows the application of ALD in the manufacturing and interfacial control of advanced catalytic and energy materials, including the interfacial performance control of the automotive exhaust and ...

The Ångström Laboratory is one of Europe's most advanced research facilities for materials science, and houses the largest university clean room in the Nordic countries, The Ångström Microstructure ...

From the last several lithography nodes, in the 14 to 10nm range, to the latest nodes, in the 7 to 5nm range, the requirements for patterning and image transfer materials have increased dramatically.