First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

(a) Unit optimization process with a hybrid continuous-discrete PSO algorithm. The particulars of the yellow and green boxes in the optimization are elaborated in (b) and (c), respectively. (b) The ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Too often, design engineers look at coating parts as an afterthought. Rather than being part of the discussion in the early stages of design, engineers sometimes try to solve problems with coatings ...